<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dcterms="http://purl.org/dc/terms/">
<rdf:Description rdf:about="https://riquim.fq.edu.uy/items/show/6625">
    <dcterms:title><![CDATA[<strong>Ab-initio study of vacancy-defective aluminium nitride nanosheets as trifluoroacetonitrile gas sensor</strong>]]></dcterms:title>
    <dcterms:subject><![CDATA[NANOTECNOLOGIA]]></dcterms:subject>
    <dcterms:subject><![CDATA[NITRURO DE ALUMINIO]]></dcterms:subject>
    <dcterms:subject><![CDATA[TEORIA DEL FUNCIONAL DE LA DENSIDAD]]></dcterms:subject>
    <dcterms:subject><![CDATA[GAS]]></dcterms:subject>
    <dcterms:subject><![CDATA[BIBLIOGRAFIA NACIONAL QUIMICA]]></dcterms:subject>
    <dcterms:subject><![CDATA[2023]]></dcterms:subject>
    <dcterms:abstract><![CDATA[Trifluoroacetonitrile (CF3CN) is a decomposition product from the promising dielectric heptafluoro isobutyronitrile (C4F7N) under partial discharge process, so can be used to detect failures in gas-insulated switchgear. In this work, we study through density functional theory (DFT) calculations the adsorption of CF3CN on pristine aluminium nitride nanosheets (AlNNS) and defective Al-vacancy (vAl) and N-vacancy (vN) AlNNS, in order to explore the potential of these nanomaterials as sensors for this gas. Our energetic analysis shows negligible adsorption energy for the pristine surface but strong interactions can be observed between the molecule and the monovacancy-defected surfaces, with adsorption energy values estimated to be about &minus; 2.2 and &minus; 3.1 eV for CF3CN/vN-AlNNS and CF3CN/vAl-AlNNS, respectively, which suggests chemisorption processes. Furthermore, our geometric and bonding studies revealed the formation of new N&mdash;Al interactions between gas and monovacancy-defected surfaces, with serious distortions for the vAl-AlNNS nanosheet. The electronic density of states and band structure analysis reveals moderate band gap variations after gas adsorption. In contrast, significant changes in the work function and the magnetic moment of defective AlNNS were computed after gas exposition, for all optimized adsorption configurations. Therefore, based on our results, vacancy-defected AlNNS could be suggested as possible material for CF3CN gas sensing.]]></dcterms:abstract>
    <dcterms:creator><![CDATA[<strong>Gonz&aacute;lez F&aacute;, A. J.</strong>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<strong>Luna, C. R.</strong>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<strong>Marchetti, J. M.</strong>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<a href="https://export.cvuy.uy/cv/?2f2e59581473324400ee29ded741b9090cc25a893e73d02669ebfbc674c9e8b9b51bb30e2bca064dc7ebbd5c39aa3c844e86e507301e912aa1b0a5ae17423fa2" target="_blank"><strong>Faccio, Ricardo</strong></a>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<strong>L&oacute;pez Corral, I.</strong>]]></dcterms:creator>
    <dcterms:source><![CDATA[Applied Surface Science v.612, 2023. -- e155803]]></dcterms:source>
    <dcterms:publisher><![CDATA[Elsevier]]></dcterms:publisher>
    <dcterms:date><![CDATA[2023]]></dcterms:date>
    <dcterms:rights><![CDATA[<p><strong>Informaci&oacute;n sobre Derechos de Autor</strong></p>
<p>(Por favor lea este aviso antes de abrir los documentos u objetos)</p>
<p><strong>La legislaci&oacute;n uruguaya protege el derecho</strong>&nbsp;de autor sobre toda creaci&oacute;n literaria, cient&iacute;fica o art&iacute;stica, tanto en lo que tiene que ver con sus derechos morales, como en lo referente a los derechos patrimoniales con sujeci&oacute;n a lo establecido por el derecho com&uacute;n y las siguientes leyes (LEY 9.739 DE 17 DE DICIEMBRE DE 1937 SOBRE PROPIEDAD LITERARIA Y ARTISTICA CON LAS MODIFICACIONES INTRODUCIDAS POR LA LEY DE DERECHO DE AUTOR Y DERECHOS CONEXOS No. 17.616 DE 10 DE ENERO DE 2003, LEY 17.805 DE 26 DE AGOSTO DE 2004, LEY 18.046 DE 24 DE OCTUBRE DE 2006 LEY 18.046 DE 24 DE OCTUBRE DE 2006)</p>
<p><strong>ADVERTENCIA -</strong>&nbsp;La consulta de este documento queda condicionada a la aceptaci&oacute;n de las siguientes condiciones de uso: Este documento es &uacute;nicamente para usos privados enmarcados en actividades de investigaci&oacute;n y docencia. No se autoriza su reproducci&oacute;n con fines de lucro. Esta reserva de derechos afecta tanto los datos del documento como a sus contenidos. En la utilizaci&oacute;n o cita de partes debe indicarse el nombre de la persona autora.</p>]]></dcterms:rights>
    <dcterms:format><![CDATA[PDF]]></dcterms:format>
    <dcterms:extent><![CDATA[9 p.]]></dcterms:extent>
    <dcterms:language><![CDATA[Ingl&eacute;s]]></dcterms:language>
    <dcterms:type><![CDATA[Art&iacute;culo]]></dcterms:type>
    <dcterms:identifier><![CDATA[10.1016/j.apsusc.2022.155803]]></dcterms:identifier>
</rdf:Description><rdf:Description rdf:about="https://riquim.fq.edu.uy/items/show/6385">
    <dcterms:title><![CDATA[<strong>Detection of SOF2 and SO2F2 through aluminium nitride nanosheets:&nbsp;a DFT study</strong>]]></dcterms:title>
    <dcterms:subject><![CDATA[NANOTECNOLOGIA]]></dcterms:subject>
    <dcterms:subject><![CDATA[TEORIA FUNCIONAL DE LA DENSIDAD]]></dcterms:subject>
    <dcterms:subject><![CDATA[DFT]]></dcterms:subject>
    <dcterms:subject><![CDATA[GAS]]></dcterms:subject>
    <dcterms:subject><![CDATA[NITRURO DE ALUMINIO]]></dcterms:subject>
    <dcterms:subject><![CDATA[ADSORCION]]></dcterms:subject>
    <dcterms:subject><![CDATA[BIBLIOGRAFIA NACIONAL QUIMICA]]></dcterms:subject>
    <dcterms:subject><![CDATA[2021]]></dcterms:subject>
    <dcterms:abstract><![CDATA[<p>Detection of sulfuryl fluoride (SO2F2) and thionyl fluoride (SOF2) can be used to find out the degradation of sulfur hexafluoride (SF6), indicating gas insulation switchgear equipment failures. In the present work, we study through first-principle DFT calculations the SOF2 and SO2F2 adsorption on aluminium nitride nanosheets (AlNNS), with the aim of to evaluate the performance of this nanomaterial as gas sensor. First, we performed an energetic, geometric and bonding analysis, obtaining considerable adsorption energy values for SO2F2 and SOF2 (&minus;1.63 and &minus;1.93 eV, respectively), which suggests these gases are chemisorbed on the AlN surface.<br />Furthermore, certain SeF bonds were broken during adsorption, while new AleF and SeN overlaps were developed. Simultaneously, an important weakening was observed for AleN bonds close to the adsorption site. The adsorption selectivity of AlNNS toward SO2F2 and SOF2 was also studied, noting that other molecules normally present in air show a lower reactivity.<br />Band structure and electronic density of states were realized in order to evaluate the sensing capacity of AlNNS surface. The obtained plots show a notorious narrowing of the band gap after gas adsorption, particularly in the case of SOF2, so an important change in the conductivity of AlNNS could be expected during gas exposition. Charge density analysis reveals an important charge transfer from AlNNS to both adsorbed gases, which suggest that this nanomaterial could behave as an n-type semiconductor. These results seem to indicate that<br />AlNNS could act with good sensibility and selectivity for SOF2 and SO2F2 detection, showing high potential as gas sensing material.</p>]]></dcterms:abstract>
    <dcterms:creator><![CDATA[<strong>Gonz&aacute;lez F&aacute;, Alejandro J.</strong>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<a href="2f2e59581473324400ee29ded741b9090cc25a893e73d02669ebfbc674c9e8b9b51bb30e2bca064dc7ebbd5c39aa3c844e86e507301e912aa1b0a5ae17423fa2" target="_blank"><strong>Faccio, Ricardo</strong></a>]]></dcterms:creator>
    <dcterms:creator><![CDATA[<strong>L&oacute;pez Corral, I.</strong>]]></dcterms:creator>
    <dcterms:source><![CDATA[Applied Surface Science&nbsp;v. 538, 2021. -- e147899]]></dcterms:source>
    <dcterms:publisher><![CDATA[Elsevier]]></dcterms:publisher>
    <dcterms:date><![CDATA[2021]]></dcterms:date>
    <dcterms:rights><![CDATA[<p dir="ltr"><strong>Informaci&oacute;n sobre Derechos de Autor</strong></p>
<p dir="ltr"><span>(Por favor lea este aviso antes de abrir los documentos u objetos)</span></p>
<p dir="ltr"><strong>La legislaci&oacute;n uruguaya protege el derechode autor</strong><span>&nbsp;sobre toda creaci&oacute;n literaria, cient&iacute;fica o art&iacute;stica, tanto en lo que tiene que ver con sus derechos morales, como en lo referente a los derechos patrimoniales con sujeci&oacute;n a lo establecido por el derecho com&uacute;n y las siguientes leyes (LEY 9.739 DE 17 DE DICIEMBRE DE 1937 SOBRE PROPIEDAD LITERARIA Y ARTISTICA CON LAS MODIFICACIONES INTRODUCIDAS POR LA LEY DE DERECHO DE AUTOR Y DERECHOS CONEXOS No. 17.616 DE 10 DE ENERO DE 2003, LEY 17.805 DE 26 DE AGOSTO DE 2004, LEY 18.046 DE 24 DE OCTUBRE DE 2006 LEY 18.046 DE 24 DE OCTUBRE DE 2006)</span></p>
<span id="docs-internal-guid-9d2103f7-7fff-c813-00c7-2528fd4891ff"><strong>ADVERTENCIA:</strong><span>&nbsp;La consulta de este documento queda condicionada a la aceptaci&oacute;n de las siguientes condiciones de uso: Este documento es &uacute;nicamente para usos privados enmarcados en actividades de investigaci&oacute;n y docencia. No se autoriza su reproducci&oacute;n con fines de lucro. Esta reserva de derechos afecta tanto los datos del documento como a sus contenidos. En la utilizaci&oacute;n o cita de partes debe indicarse el nombre de la persona autora.</span></span>]]></dcterms:rights>
    <dcterms:format><![CDATA[PDF]]></dcterms:format>
    <dcterms:language><![CDATA[Ingl&eacute;s]]></dcterms:language>
    <dcterms:type><![CDATA[Art&iacute;culo]]></dcterms:type>
    <dcterms:identifier><![CDATA[<span id="docs-internal-guid-b24d2c5a-7fff-1e26-d6ab-cc6cedb2cbc5"><span>10.1016/j.apsusc.2020.147899&nbsp; </span></span>]]></dcterms:identifier>
</rdf:Description></rdf:RDF>
